Notice: Application deadline for the 2025 Joint Developed Project is 24:00, November 30, 2024 (Saturday). Late submissions will not be accepted.

Call for Submissions for the 2025 Joint Developed Project (JDP)
 

1. In order to add value to the excellent research results of the academia and nurture medium-to-high level research talent with a Master’s or Doctoral degree to maintain Taiwan’s competitive advantage in the high-tech industry, this project is implemented by the Taiwan Semiconductor Research Institute, National Institutes of Applied Research (hereinafter referred to as the TSRI) to assist domestic professors in the joint development of advanced nanodevice technologies.
    
2. Applications are open, effective immediately. Please email your pre-proposal to the project contact by November 30, 2024 (Saturday). Late submissions will not be accepted.
    
3. Application Guideline and Pre-Proposal Preparation:
   1. Application eligibility: Professors in domestic public or private universities and colleges, who have held full-time teaching and research position domestically or internationally within the past five years, or obtained a doctoral degree within the past five years, may apply for this project with reviewing in a rolling basis.
   2. Project duration: The project will be reviewed annually, and the duration is one year (2025/1/1-2025/12/31)
   3. Supporting items: TSRI equipment usage fee grant, and a quota of at most two students entitled to the following courses free of charge: Semiconductor Process Technology Training Class (SM01) and Semiconductor Process Equipment Internship Class (SM01-1).
   4. Application materials: Project pre-proposal (at most two pages of A4, with horizontal writing from top to bottom and a font size of 14pt)
   5. Basis for the approval of equipment usage fee grant:
      1. Content of the Project Pre-proposal: The TSRI’s equipment supportability (20%)
      2. Count on the TSRI’s Performance Achievement Maintenance System in the last three years: Number of members who completed Master’s degree theses/Doctoral degree dissertations (40%), number of papers published and patents obtained (40%)
   6. Incentive measures: In line with the Chip-based Industrial Innovation Program and to support Taiwan’s semiconductor infrastructure and talent development policies, this project encourages more research teams to engage in the semiconductor field. Research teams, without any service record for process technology in TSRI over the past three years or making a submission for the first time, will be given a grant of NT$1 million for equipment usage in the project year.
4. Project Obligations
   1. Research achievements, including paper publication, talent development, patent, technology transfer and other awards, must be recorded online through the designated reporting system provided by the TSRI.
   2. Acknowledgment of the Taiwan Semiconductor Research Institute is required for paper publication.
   3. All of the intellectual property (patent, technology transfer and others) jointly developed by both parties, if any, shall be processed in accordance with the regulations of National Science and Technology Council and National Institutes of Applied Research.

Download Forms

• Appendix 1: TSRI Nanotechnology Industry Joint Developed Project Pre-proposal
• Appendix 2: Nanotechnology Industrial Advanced Talent Development Program Workflow
• Appendix 3: Nanotechnology Industry Joint Developed Project Outcome Report

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